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AMI Semiconductor Layer Map
C5
This is the layer map for the AMI C5F/N 0.50 micron 3 metal, 2 poly
(non-silicided) layout rules (AMI_C5F/N), and only for those AMI vendor
design rules. For designs that are laid out using other design rules
(or
technology-codes),
use the standard layer mapping conventions of that design rule set.
For submissions in GDS format, the datatype is "0" (zero) unless
specified in the map below.
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Layer
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GDS
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CIF
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Notes
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N_WELL
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1
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A01
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ACTIVE
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2
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A02
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N_CHANNEL_FLD
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3
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A03
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Derived from N_WELL when N_CHANNEL_FLD is completely absent from
layout. See Note #1
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POLY
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4
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A04
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N_PLUS_BLOCK
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5
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A05
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A copy of the drawn P_PLUS_SELECT is used when N_PLUS_BLOCK is
completely absent from layout. See Note #1
AMI calls this layer N_PLUS_SELECT and further requires that it be a
copy of P_PLUS_SELECT. It is functionally an N_PLUS_BLOCK layer; the
drawn regions will not receive the n+ implant.
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P_PLUS_SELECT
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6
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A06
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CONTACT
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8
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A08
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METAL1
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9
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A09
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VIA1
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10
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A10
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METAL2
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11
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A11
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VIA2
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12
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A12
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METAL3
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13
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A13
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CAP_POLY (POLY2)
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26
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A26
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Optional
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HRP (HIGH RESISTANCE)
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27
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A27
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THICK_GATE
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28
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A28
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C5F layer
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N_MINUS_IMPLANT (Npblk)
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36
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A36
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C5F layer
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P_MINUS_IMPLANT (Ppblk)
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37
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A37
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C5F layer
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GLASS
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14
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A14
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Note #1:
If this layer is present anywhere in the submitted design or anywhere
in the design after instantiation, then MOSIS will not derive it. If
this layer is not in the submitted design or anywhere in the design
after instantiation, then MOSIS will derive that layer from the listed
layers. MOSIS does not create a layer partially from a layer drawn by
the customer and partially derived from other layers.
Related Links
Fabrication Schedule
Customer Support
MOSIS Products
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