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IBM Fabrication Technology descriptions, MPW fabrication schedule, and vendor document access procedures for the IBM fabrication processes available through MOSIS. IBM Fabrication Processes The IBM fabrication processes available through MOSIS range from 45 nanometer to 0.25 µm in CMOS, and from 0.13 µm to 0.50 µm in SiGe BiCMOS. IBM Fabrication Schedule MOSIS offers a multiproject wafer (MPW) run schedule through IBM. To be considered ontime for an MPW run, layout and paperwork are due to MOSIS by 1 PM PT (Pacific/California Time) on the date listed. IBM Taxi Runs MOSIS offers taxi runs for IBM processes, including some not available on shared multi-project wafer runs. IBM Design Kits:   CMOS   |   SiGe IBM design kits are available upon approval for MOSIS customers. How To Access IBM Documents General instructions for accessing IBM design rules and cell libraries through MOSIS. International Traffic in Arms Regulations (ITAR) All IBM processes offered through MOSIS support designs subject to export control under ITAR regulations. Related Links MOSIS Fabrication Processes

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