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ON Semiconductor
(formerly AMIS)
0.50 Micron
C5 Process
Process Family Description
This non-silicided CMOS process has 3 metal layers and 2 poly layers,
and a high resistance layer. Stacked contacts are supported. The
process is for 5 volt applications. MOSIS orders epi wafers for this
process. For further information, see the
AMIS Mixed Signal Foundry Services web page.
C5N Process
PiP (poly2 over poly) capacitors (950 aF/µm²) and the HRP
(High Resistance) option are available on multiproject runs.
C5F Process
The C5F process offers the above layers of C5N plus Thick_Gate,
N_Minus_Implant (Npblk), and P_Minus_Implant (Ppblk).
Design Rules
This process supports the following design rules.
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Design Rules
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Lambda1
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Feature Size1
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Availablility
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ON Semi C5F/N Rules
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n/a
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0.60
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MOSIS, ON Semiconductor
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SCMOS_SUBM
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0.30
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0.60
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MOSIS in
HTML
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SCMOS
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0.35
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0.60
(after sizing)
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MOSIS in
HTML
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1Values in micrometers (µm)
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Review the
CMP and antenna guidelines which apply to both sets of design
rules.
MOSIS Technology Codes
See
Technology Codes for ON Semiconductor C5F/N Process.
Important note about pads
The bonding pads on designs submitted to these runs should have metal2
(and via2) under the metal3. If these guidelines are not followed,
metal lifting problems can occur.
ON Semiconductor Design Rules, Process Specifications, and SPICE
Parameters
ON Semiconductor has sub-licensed MOSIS to distribute this information to
customers who do not have a
MyAMIS or MyON account. To obtain any of these items you must have
an account with MOSIS, submit the on-line ON Semiconductor Access
Request, then sign both the Confidentiality Agreement (CDA) and Design
Kit License Agreement (DKLA).
Parametric Test Results and SPICE Model Parameters
See Test Results for
ON Semiconductor C5F/N runs.
Reticle/Wafer Size, Steps, Turnaround Time, Wafer and Die Thickness
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ON Semiconductor C5 Process
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Wafer Size
(inches)
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Reticle Size (mili- meters, approx.)
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Reticle Copies Stepped on Wafer (approx.)
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Turn- around Time (weeks, approx.)
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Die Thickness
(+/- .5 mil)
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Wafer Thickness
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Mils
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Micro- meters
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Mils
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Micro- meters
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8
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21 x 21
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55
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10 - 12
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10
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250
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30
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760
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Related Links
MOSIS-Supported ON Semiconductor Processes
ON Semiconductor Technology
Codes & Layer Maps
ON Semiconductor Document Access
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