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IBM Fabrication
Technology descriptions, MPW fabrication schedule, and vendor
document access procedures for the IBM fabrication processes
available through MOSIS.
IBM Fabrication Processes
The IBM fabrication processes available through MOSIS range from
65 nanometer to 0.25 µm in CMOS, and from
0.13 µm to 0.50 µm in SiGe BiCMOS.
IBM Fabrication Schedule
MOSIS offers a multiproject wafer (MPW) run schedule through IBM. To
be considered ontime for an MPW run, layout and paperwork are due to
MOSIS by 1 PM PT (Pacific/California Time) on the date listed.
IBM Taxi Runs
MOSIS offers taxi runs for IBM processes, including some not
available on shared multi-project wafer runs.
IBM Design Kits:
CMOS
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SiGe
IBM design kits are available upon approval for MOSIS customers.
How To Access IBM Documents
General instructions for accessing IBM design rules and cell
libraries through MOSIS.
International Traffic in Arms Regulations (ITAR)
All IBM processes offered through MOSIS support designs subject to
export control under ITAR regulations.
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Related Links
MOSIS Fabrication Processes
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