Products > Fab Processes > IBM
Technology descriptions, MPW fabrication schedule, and vendor document access procedures for the IBM fabrication processes available through MOSIS.
The IBM fabrication processes available through MOSIS range from 32 nanometer to 0.25 µm in CMOS, and from 0.13 µm to 0.50 µm in SiGe BiCMOS.
MOSIS offers a multiproject wafer (MPW) run schedule through IBM. To be considered ontime for an MPW run, layout and paperwork are due to MOSIS by 1 PM PT (Pacific/California Time) on the date listed.
MOSIS offers taxi runs for IBM processes, including some not available on shared multi-project wafer runs.
IBM design kits are available upon approval for MOSIS customers.
General instructions for accessing IBM design rules and cell libraries through MOSIS.
All IBM processes offered through MOSIS support designs subject to export control under ITAR regulations.