Products > Fab Processes > ON Semiconductor > ON Semi 0.50 Micron C5 Process
ON Semiconductor (formerly AMIS) 0.50 Micron
Process Family Description
This non-silicided CMOS process has 3 metal layers and 2 poly layers, and a high resistance layer. Stacked contacts are supported. The process is for 5 volt applications. MOSIS orders epi wafers for this process. For further information, see the ON Semiconductor Foundry Mixed-Signal Offerings web page.
PiP (poly2 over poly) capacitors (950 aF/µm²) and the HRP (High Resistance) option are available on multiproject runs.
The C5F process offers the above layers of C5N plus Thick_Gate, N_Minus_Implant (Npblk), and P_Minus_Implant (Ppblk).
This process supports the following design rules.
|Design Rules||Lambda1||Feature Size1||Availablility|
|ON Semi C5F/N Rules||n/a||0.60||MOSIS, ON Semiconductor|
|SCMOS_SUBM||0.30||0.60||MOSIS in PDF|
|MOSIS in PDF|
|1Values in micrometers (µm)|
Review the CMP and antenna guidelines which apply to both sets of design
MOSIS Technology Codes See Technology Codes for ON Semiconductor C5F/N Process.
Important note about pads. The bonding pads on designs submitted to these runs should have metal2 (and via2) under the metal3. If these guidelines are not followed, metal lifting problems can occur.ON Semiconductor Design Rules, Process Specifications, and SPICE Parameters
ON Semiconductor has sub-licensed MOSIS to distribute this information to customers who do not have a MyAMIS or MyON account. To obtain any of these items you must have an account with MOSIS, submit the on-line ON Semiconductor Access Request, then sign both the Confidentiality Agreement (CDA) and Design Kit License Agreement (DKLA).
Parametric Test Results and SPICE Model ParametersSee Test Results for ON Semiconductor C5F/N runs. Reticle/Wafer Size, Steps, Turnaround Time, Wafer and Die Thickness.
|ON Semiconductor C5 Process|
|Reticle Size (mili- meters, approx.)||Reticle Copies Stepped on Wafer (approx.)||Turn- around Time (weeks, approx.)(1)||
(+/- .5 mil)
|Mils||Micro- meters||Mils||Micro- meters|
|8||21 x 21||55||10 - 12(1)||10||250||30||760|
(1)ON Semi is running beyond full capacity, which has resulted in wafer start delays. Wafer processing may be delayed as much as 16 weeks. These delays cannot be recovered during fabrication and will therefore impact the amount of time it takes for MOSIS to deliver parts.