Products > Fab Processes > Tezzaron
Tezzaron Fabrication Processes
The initial Tezzaron 3DIC two-tier multiproject wafer (MPW) run available through MOSIS is TEZZ_2X_GF_013, using Globalfoundries' 130 nm CMOS process.
MOSIS offers access to the Tezzaron multiproject wafer (MPW) runs. To be considered ontime for an MPW run, layout and paperwork are due to MOSIS by 1 PM PT (Pacific/California Time) on the date listed.
Tezzaron Manual and Design Kits
Tezzaron design kits are available upon approval for MOSIS customers.
How To Access Tezzaron Process and Documents
Send your request to MOSIS Customer Support System.