TSMC25

TSMC Layer Map

This is the layer map for the TSMC 0.25 micron 5 metal, 1 poly (silicided) layout rules (TSMC25), and only for those TSMC vendor design rules. For designs that are laid out using other design rules (or technology codes), use the standard layer mapping conventions of that design rule set.

Layer GDS CIF Notes
Layer Datatype  
N_WELL 2 0 T02  
DEEP_NWELL 82 0 T82 Optional
THIN_OXIDE (OD) 3, 11, 12 0 T03, T11, T12  
THICK_OXIDE (OD2) 4 0 T04 Optional
POLY 13 0 T13  
RPO 34 0 T34 Optional
2VN 61 0 T61 Derived from NP, OD2, N_Well when 2VN is completely absent from layout. See Note #3
3VN 5 0 T05 Derived from NP, OD2, N_Well when 3VN is completely absent from layout. See Note #3
NT_N 129 0 T129 Optional
P_PLUS_SELECT (PP) 7 0 T07  
N_PLUS_SELECT (NP) 8 0 T08  
ESD_3V 30 0 T30 Optional
CONTACT 15 0 T15  
METAL1 16 0 T16  
METAL1_FILL 16 1 T16F See Note #1
METAL1_SLOT 16 2 T16S See Note #1  
VIA 17 0 T17  
METAL2 18 0 T18  
METAL2_FILL 18 1 T18F See Note #1
METAL2_SLOT 18 2 T18S See Note #1
VIA2 27 0 T27  
METAL3 28 0 T28  
METAL3_FILL 28 1 T28F See Note #1
METAL3_SLOT 28 2 T28S See Note #1
VIA3 29 0 T29  
METAL4 31 0 T31  
METAL4_FILL 31 1 T31F See Note #1
METAL4_SLOT 31 2 T31S See Note #1  
CAP_TOP_METAL 67 4 T67 Optional; see Note #2
VIA4 32 0 T32  
METAL5 33 0 T33  
METAL5_FILL 33 1 T33F See Note #1
METAL5_SLOT 33 2 T33S See Note #1
VARDUMMY 138 0 T138 Optional
RWDMY 52 0 T52 Optional
RLPPDMY 134 0 T134 Optional
NDDD 21 0 T21 Optional
LPP 48 0 T48 Optional
GLASS 19 0 T19

Note #1:

MOSIS started to recognize and process these optional metal fill and slot layers with runs that closed in July, 2003.

Note #2:

This layer, which forms a MiM capacitor with METAL4 as the bottom layer, is the standard MiM for MOSIS MPW runs. Other CTM layers, which use different bottom plates, are also available, but only by special order. The GDS datatype indicates the bottom metal layer that is intended.

Note #3:

If this layer is present anywhere in the submitted design or anywhere in the design after instantiation, then MOSIS will not derive it. If this layer is not in the submitted design or anywhere in the design after instantiation, then MOSIS will derive that mask from the listed layers. MOSIS cannot create a mask partially from a layer drawn by the customer and partially derived from other layers.