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MOSIS MPW Fabrication Schedules
MOSIS scheduled multiproject wafer (MPW) fabrication runs.
MOSIS offers multiproject wafer (MPW) runs for the following IC fabricators (foundries).
Dedicated runs (also known as COT or Customer Owned Tooling runs) are available for all processes. Dedicated runs can be scheduled to start at any time.
Globalfoundries Fabrication Schedule
Scheduled Globalfoundries Runs Through MOSIS
GlobalShuttle
Participants on Globalfoundries' GlobalShuttle MPW runs must adhere to the GlobalShuttle timeline. The GlobalShuttle timeline does not apply to GFUS processes.
Globalfoundries featured processes:
Globalfoundries US (GFUS) -- New Timeline for GFUS
GFUS processes are not contrained by the GlobalShuttle timeline. To be considered on time for a MOSIS led (GFUS) MPW run, the designer must meet milestones on the Timeline for GFUS.
GFUS featured processes:
GFUS SiGe:
9HP (90 nm),
8HP (0.13 µm),
8XP (0.13 µm).
GFUS SOI:
7SW (0.18 µm) and
45RFSOI (45 nm)
GFUS Silicon Photonics:
9WG (90 nm)
Participants for GFUS must adhere to the Globalfoundries US (GFUS) Tape Out Timeline
TSMC Fabrication Schedule
Participants on TSMC CyberShuttle MPW runs through MOSIS must adhere to the TSMC timeline. The TSMC timeline does not apply to dedicated runs.
TSMC featured processes:
28 nm, 40 / 45 nm, 65 nm, 130 nm, 180 nm, 250 nm.
AIM Photonics Institute Fabrication Schedule
AIM Silicon Photonics Full(active), Passive and Interposer processes
ON Semiconductor Fabrication Schedule
ON Semi featured CMOS processes
B5 (0.5 µm) CMOS
| Fabrication Schedule |
|
AUG 12 GF 018 GF 018_BCD GF 018_TGO GF 55BCDLITE1 GF 55LPE GF 55LPX GFUS 8XP AUG 13 TSMC 28 nm AUG 19 TSMC 40 nm TSMC 45 nm AUG 26 GFUS 9WG AUG 27 TSMC 0.13 µm TSMC 0.25 µm SEP 02 GF 22FDX GF 40LP SEP 03 TSMC 0.18 µm SEP 09 GF 013_BCD GF 013_BCDLITE GF 013_LP TSMC 0.18 µm TSMC 28 nm TSMC 65 nm SEP 11 GF 12LP SEP 16 TSMC 40 nm TSMC 45 nm SEP 17 TSMC 0.18 µm SEP 23 GFUS 8WL SEP 24 TSMC 0.13 µm TSMC 0.25 µm OCT 01 TSMC 0.18 µm |