MOSIS Fabrication Processes

Technology descriptions, fabrication schedules, and vendor document access procedures for the GlobalFoundries, TSMC, ON Semi and AIM Photonics fabrication processes available through MOSIS.

TSMC Fabrication Processes

TSMC processes available through MOSIS include 28 nm, 40 / 45 nm, 65 nm, 130 nm, 180 nm, 250 nm.

GlobalFoundries Fabrication Processes

GlobalFoundries processes available through MOSIS include 12 nm FinFET, 22 FDX, 45 RFSOI, 55 nm, 0.18 µm, 9HP (90 nm), 8HP (0.13 µm), 8XP (0.13 µm) and 9WG (90 nm).

ON Semiconductor Fabrication Processes

ON Semiconductor processes available through MOSIS is 500 nanometer CMOS.

AIM Fabrication Processes

AIM Photonics processes available through MOSIS includes Silicon Photonics Full(active), Passive and Interposer.

For more information about MOSIS fabrication processes, please contact MOSIS Support Staff.